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1 microwave plasma chemical vapor deposition method
Chemistry: MPCVDУниверсальный русско-английский словарь > microwave plasma chemical vapor deposition method
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2 метод осаждения из парообразного состояния
Astronautics: vapor-deposition methodУниверсальный русско-английский словарь > метод осаждения из парообразного состояния
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3 химическое парофазное осаждение, активированное микроволновой плазмой
Универсальный русско-английский словарь > химическое парофазное осаждение, активированное микроволновой плазмой
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4 осаждение
1. sedimentation2. precipitation3. deposition[lang name="Russian"]вакуумное осаждение; вакуумное напыление — vacuum deposition
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5 метод осаждения из паровой фазы
1) Engineering: vapour-deposition method2) Makarov: vapor-plating techniqueУниверсальный русско-английский словарь > метод осаждения из паровой фазы
См. также в других словарях:
Combustion chemical vapor deposition — (CCVD) is a chemical process by which thin film coatings are deposited onto substrates in the open atmosphere. Contents 1 History 2 Principles and procedure 3 Remote combustion chemical v … Wikipedia
Chemical vapor deposition of ruthenium — is a method to deposit thin layers of ruthenium on substrate by Chemical vapor deposition (CVD). A unique challenge arises in trying to grow impurity free films of a catalyst in Chemical vapor deposition (CVD). Ruthenium metal activates C H and C … Wikipedia
Hybrid Physical-Chemical Vapor Deposition — (HPCVD) is a thin film deposition technique that combines physical vapor deposition (PVD) with chemical vapor deposition (CVD). For the instance of magnesium diboride (MgB2) thin film growth, HPCVD process uses diborane (B2H6) as the boron… … Wikipedia
Physical vapor deposition — (PVD) is a variety of vacuum deposition and is a general term used to describe any of a variety of methods to deposit thin films by the condensation of a vaporized form of the material onto various surfaces (e.g., onto semiconductor wafers). The… … Wikipedia
Electron beam physical vapor deposition — or EBPVD is a form of physical vapor deposition in which a target anode is bombarded with an electron beam given off by a charged tungsten filament under high vacuum. The electron beam causes atoms from the target to transform into the gaseous… … Wikipedia
Chemical vapor deposition of diamond — Colorless gem cut from diamond grown by chemical vapor deposition Chemical vapor deposition of diamond or CVD is a method of producing synthetic diamond by creating the circumstances necessary for carbon atoms in a gas to settle on a substrate in … Wikipedia
Chemical Vapor Deposition — (CVD) A method of depositing thin semiconductor films used to make certain types of solar photovoltaic devices. With this method, a substrate is exposed to one or more vaporized compounds, one or more of which contain desirable constituents. A… … Energy terms
Physical Vapor Deposition — A method of depositing thin semiconductor photovoltaic) films. With this method, physical processes, such as thermal evaporation or bombardment of ions, are used to deposit elemental semiconductor material on a substrate … Energy terms
Evaporation (deposition) — Evaporation machine used for metallization at LAAS technological facility in Toulouse, France. Evaporation is a common method of thin film deposition. The source material is evaporated in a vacuum. The vacuum allows vapor particles to travel… … Wikipedia
Sputter deposition — is a physical vapor deposition (PVD) method of depositing thin films by sputtering, that is ejecting, material from a target, that is source, which then deposits onto a substrate, such as a silicon wafer. Resputtering is re emission of the… … Wikipedia
Pulsed laser deposition — (PLD) is a thin film deposition (specifically a physical vapor deposition, PVD) technique where a high power pulsed laser beam is focused inside a vacuum chamber to strike a target of the desired composition. Material is then vaporized from the… … Wikipedia